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ALD in short
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Chemical vrtpor depoaltlon bnsed on snturatlng aurface
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• lyph elly Iwo prfflurt.oi Chemical* UL,1
• Inni < .min i|.r.( typie .illy M l iiiImi aumiu » i u n *=*• -V ^
• t hfmi« ,ih mrri only on thr surfnc*'
• suif*n c < uiUrolknl, snlf llmłttng film growth
• invrntfd in 1974 (Dr. Suntola) to tnoblt Thln Mim fclccUolumlMrsccnt (TFEL) display manufacturing
• TFEL was ihe mam ALD applicatlon for the flrst 25 years
Substratc
• Semlconductor Industry found ALD durlng 90 s
• Intel'5 production for gatc oxłdc started (n Dccember 2007
• Fastest processors, memory devices and hard dlsks are enabled by ALD
August 2008
ji « « Sof 3I >~»I t1i8Sn Q mT !K~ aj
|#rwq €> 2001
AteutAMlay... M Adobe te obal ...
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